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OPTISCHE 3D-DIMENSIONIERUNG MIT DUALER STRUKTUR

Patentnummer:EP3798569B1
IPC Hauptklasse:G01B11/25
Anmelder:HONEYWELL INT INC (4)
Erfinder:BRACKEN SCOTT (1)
FENG CHEN (1)
POLONIEWICZ PAUL (1)
XIAN TAO (1)
Anmeldung:25.09.20
Patenterteilung:16.08.23
Einspruch bis:16.05.24

Abstract / Hauptanspruch
An optical dimensioning system includes one or more light emitting assemblies configured to project one or more predetermined patterns on an object; an imaging assembly configured to sense light scattered and/or reflected off the object, and to capture an image of the object while the patterns are projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. The light emitting assembly may include a single piece optical component configured for producing a first pattern and second pattern. The patterns may be distinguishable based on directional filtering, feature detection, feature shift detection, or the like. A method for optical dimensioning includes illuminating an object with at least two detectable patterns; and calculating dimensions of the object by analyzing pattern separate of the elements comprising the projected patterns. One or more pattern generators may produce the patterns.


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