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INSPEKTIONSSYSTEM UND INSPEKTIONSVERFAHREN

Patentnummer:EP3327402B1
IPC Hauptklasse:G01B11/25
Anmelder:KOH YOUNG TECH INC (1)
株式会社高迎科技 (1)
주식회사 고영테크놀러지 (1)
Erfinder: (6)
AHN WON MI (1)
LEE HYE IN (1)
LEE JONG HUI (1)
SEO SEUNG AE (1)
Anmeldung:18.07.16
Patenterteilung:03.11.21
Einspruch bis:03.08.22

Abstract / Hauptanspruch
Disclosed are an inspection system and an inspection method of performing image processing on an outline of an inspection object according to whether the inspection object is good or defective, and overlapping and displaying the image-processed outline with reference information for determining whether the inspection object is good or defective. The inspection system includes: a data acquisition unit configured acquire an image of an inspection object by irradiate light on the inspection object; a processing unit configured to detect an outline of the inspection object based on the image data of the inspection object; and an output unit configured to overlap and display the outline with reference information, wherein the processing unit is configured to determine whether the outline is good or defective based on the reference information to perform image processing on the outline according to whether the outline is good or defective.


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