patentverein.de - Patente
Patentethik
Überwachung
Beispielhaft
Trivial
Kurios
Unverständlich
Zurück Europäisches Patentamt

MESSVORRICHTUNG, BEOBACHTUNGSVORRICHTUNG UND MESSVERFAHREN

Patentnummer:EP3428573B1
IPC Hauptklasse:G01B11/26
Anmelder:HAMAMATSU PHOTONICS KK (1)
浜松ホトニクス株式会社 (1)
하마마츠 포토닉스 가부시키가이샤 (1)
Erfinder:NAKAMURA TOMONORI (1)
Anmeldung:07.03.17
Patenterteilung:03.11.21
Einspruch bis:03.08.22

Abstract / Hauptanspruch
The present invention relates to a measuring device having a structure for adjusting inclination of an observation surface of a sample with respect to a reference surface which is orthogonal to an optical axis of an objective lens, and the like. The measuring device includes a scanner, arranged on a propagation path of illumination light traveling from a light source toward the sample, configured to change an emission angle of the illumination light, and inclination information of the sample is obtained by associating a signal value of a detection signal for reflected light from the sample and the emission angle of the illumination light, while changing the emission angle of the illumination light by the scanner.


Kommentare zu diesem Patent schicken Sie bitte an
Datenschutzerklärung