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Europäisches Patentamt

DUAL-PATTERN OPTICAL 3D DIMENSIONING | OPTISCHE 3D-DIMENSIONIERUNG MIT ZWEI MUSTERN | DIMENSIONNEMENT 3D OPTIQUE À DOUBLE MOTIF

Patentnummer:EP3435026B1
IPC Hauptklasse:G01B001100
Anmelder:
Erfinder:
Anmeldung:20.07.18
Offenlegung:24.07.17
Patenterteilung:27.11.19

Abstract / Hauptanspruch
An optical dimensioning system includes one or more light emitting assemblies configured to project a predetermined pattern on an object; an imaging assembly configured to sense light scattered and/or reflected of the object, and to capture an image of the object while the pattern is projected; and a processing assembly configured to analyze the image of the object to determine one or more dimension parameters of the object. A method for optical dimensioning includes illuminating an object with at least two identical patterns; capturing at least one image of the illuminated object; and calculating dimensions of the object by analyzing pattern separation of the elements comprising the projected patterns. The patterns can be produced by one or more pattern generators.



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