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A method for measuring a high accuracy height map of a test surface | Verfahren zur Messung einer hochgenauen Höhenkarte einer Testoberfläche | Procédé de mesure d'une carte de hauteur à grande précision pour une surface de test

Patentnummer:EP2977720B1
IPC Hauptklasse:G01B001124
Anmelder:Mitutoyo Corporation (0)
20-1, Sakado 1-chome, ; Takatsu-ku, ; Kawasaki, Kanagawa 213-0012, JP
Erfinder:
Anmeldung:25.07.14
Offenlegung:25.07.14
Patenterteilung:05.06.19

Abstract / Hauptanspruch
The invention relates to a method for measuring a high accuracy height map of a test surface using a multi sensor optical profiler. The method comprises:
measuring a coarse height map of the test surface with a pre-map sensor provided to the optical profiler with a relatively long working distance and/or a large field of view;
storing the coarse height map in a memory;
subdividing the coarse height map into sections as appropriate for the field of view of a relatively high resolution optical profiler sensor provided to the optical profiler;
calculating the corresponding X, Y and Z positions for the high resolution optical profiler sensor with respect to the test surface;
calculating a trajectory in the X, Y, Z-direction for the high resolution optical profiler sensor with respect to the test surface using the calculated X, Y, Z-positions;
moving the optical profiler in the X, Y, Z-direction with respect to the test surface according to the trajectory; and,
measuring a high accuracy height map with the high resolution optical profiler sensor.

EP2977720B1


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