patentverein.de - Patente
Patentethik
Überwachung
Beispielhaft
Trivial
Kurios
Unverständlich

Anmelder = KLA-Tencor Corporation


Erteilte Patente in der Einspruchsfrist

(DE B,C: 3 Monate nach Erteilung; EP B,C: 9 Monate nach Erteilung)

Patentschrift
Erteilung (Frist)
Anmelder
Titel der Erfindung (Arbeitstitel)
US10295342B2
21.05.19 (4)
System, method and computer program product for calibration of metrology tools
KLA-Tencor Corporation
US10317198B2
11.06.19 (23)
Three-dimensional mapping of a wafer
KLA-Tencor Corporation
US10337852B1
02.07.19 (45)
Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrate
KLA-Tencor Corporation
US10352691B1
16.07.19 (59)
Systems and methods for wafer structure uniformity monitoring using interferometry wafer geometry tool
KLA-Tencor Corporation
US10365225B1
30.07.19 (73)
Multi-location metrology
KLA-Tencor Corporation
EP2625487B1
14.08.19 (87)
METHOD OF DETERMINING AN ASYMMETRIC PROPERTY OF A STRUCTURE | VERFAHREN ZUR BESTIMMUNG EINER ASYMMETRISCHEN EIGENSCHAFT EINER STRUKTUR | PROCÉDÉ POUR DÉTERMINER UNE PROPRIÉTÉ ASYMÉTRIQUE D'UNE STRUCTURE
KLA-Tencor Corporation
US10401279B2
03.09.19 (107)
Process-induced distortion prediction and feedforward and feedback correction of overlay errors
KLA-Tencor Corporation
US10408602B2
10.09.19 (114)
Quality estimation and improvement of imaging metrology targets
KLA-Tencor Corporation
US10458912B2
29.10.19 (163)
Model based optical measurements of semiconductor structures with anisotropic dielectric permittivity
KLA-Tencor Corporation
US10458777B2
29.10.19 (163)
Polarization measurements of metrology targets and corresponding target designs
KLA-Tencor Corporation
US10481088B2
19.11.19 (184)
Automatic determination of fourier harmonic order for computation of spectral information for diffraction structures
KLA-Tencor Corporation
Neuer Eintrag!
Datenschutzerklärung