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Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector

Patentnummer:US10234271B2
IPC Hauptklasse:G01B001100
Anmelder:KLA-Tencor Corporation (0)
One Technology Drive, Milpitas, CA 95035, US
Erfinder:
Anmeldung:10.08.18
Offenlegung:05.12.14
Patenterteilung:19.03.19

Abstract / Hauptanspruch
A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.

US10234271B2


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