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Periodic patterns and technique to control misalignment between two layers

Patentnummer:US10151584B2
IPC Hauptklasse:G01B001100
Anmelder:KLA-Tencor Corporation (0)
One Technology Drive, Milpitas, CA 95035, US
Erfinder:Abdulhalim, Ibrahim (0)
P.O.Box 942, Kfar Manda 17907, IL
ADEL, Mike (0)
14 Yigal Alon Street, 30900 Zichron Ya-akov, IL
FAEYRMAN, Michael (0)
28/12 Menachim Begin Street, 26100 Kiryat Motzkin, IL
FRIEDMANN, Michael (0)
23/2 Hazait Street, 36760 Nesher, IL
Anmeldung:30.10.17
Offenlegung:10.04.01
Patenterteilung:11.12.18

Abstract / Hauptanspruch
A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.

US10151584B2


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