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Micrometer | Mikrometer | Micromètre

Patentnummer:EP2657641B1
IPC Hauptklasse:G01B000318
Anmelder:Mitutoyo Corporation (0)
20-1, Sakado 1-chome, ; Takatsu-ku, ; Kawasaki, Kanagawa 213-0012, JP
Erfinder:Tsuji, Shozaburo (0)
Mitutoyo Corporation; 1-20-1, Sakado; Takatsu-ku, Kawasaki-shi; Kanagawa 213-8533, JP
Anmeldung:05.04.13
Offenlegung:23.04.12
Patenterteilung:06.12.17

Abstract / Hauptanspruch
A micrometer (1) includes: a frame (10); an anvil (11); a spindle (20); an encoder (40); a display (60); a strain gauge (50) that detects a deformation of the frame; a storage that stores a change amount of the detection value (a displacement of the spindle detected by the encoder) per a unit deformation detected by the strain gauge, as a compensation factor; and a compensator that compensates the detection value based on a difference between a zeroset-time deformation that is detected by the strain gauge when a command for zeroset is given and a measurement-time deformation that is detected by the strain gauge in measurement, and based on the compensation factor stored in the storage.

EP2657641B1


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