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Anmelder = KLA-Tencor Corporation


Erteilte Patente in der Einspruchsfrist

(DE B,C: 3 Monate nach Erteilung; EP B,C: 9 Monate nach Erteilung)

Patentschrift
Erteilung (Frist)
Anmelder
Titel der Erfindung (Arbeitstitel)
US10072921B2
11.09.18 (47)
Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element
KLA-Tencor Corporation
US10088298B2
02.10.18 (68)
Method of improving lateral resolution for height sensor using differential detection technology for semiconductor inspection and metrology
KLA-Tencor Corporation
US10095121B2
09.10.18 (75)
Optimizing the utilization of metrology tools
KLA-Tencor Corporation
US10101676B2
16.10.18 (82)
Spectroscopic beam profile overlay metrology
KLA-Tencor Corporation
EP3163251B1
14.11.18 (111)
METHOD AND SYSTEM FOR REGIONAL PHASE UNWRAPPING WITH PATTERN-ASSISTED CORRECTION | VERFAHREN UND SYSTEM ZUR REGIONALEN PHASENABWICKLUNG MIT STRUKTURUNTERSTÜTZTER KORREKTUR | PROCÉDÉ ET SYSTÈME DE DÉPLIEMENT DE PHASE RÉGIONALE AVEC CORRECTION ASSISTÉE PAR MOTIF
KLA-Tencor Corporation
US10151584B2
11.12.18 (139)
Periodic patterns and technique to control misalignment between two layers
KLA-Tencor Corporation
US10190868B2
29.01.19 (187)
Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing
KLA-Tencor Corporation
US10197389B2
05.02.19 (194)
Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
KLA-Tencor Corporation
US10215693B2
26.02.19 (215)
Infrared spectroscopic reflectometer for measurement of high aspect ratio structures
KLA-Tencor Corporation
US10215560B2
26.02.19 (215)
Method for shape classification of an object
KLA-Tencor Corporation
US10215559B2
26.02.19 (215)
Metrology of multiple patterning processes
KLA-Tencor Corporation
US10234280B2
19.03.19 (238)
Reflection symmetric scatterometry overlay targets and methods
KLA-Tencor Corporation
Neuer Eintrag!
US10234271B2
19.03.19 (238)
Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector
KLA-Tencor Corporation
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