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Anmelder = KLA-Tencor Corporation


Erteilte Patente in der Einspruchsfrist

(DE B,C: 3 Monate nach Erteilung; EP B,C: 9 Monate nach Erteilung)

Patentschrift
Erteilung (Frist)
Anmelder
Titel der Erfindung (Arbeitstitel)
US10088298B2
02.10.18 (13)
Method of improving lateral resolution for height sensor using differential detection technology for semiconductor inspection and metrology
KLA-Tencor Corporation
US10095121B2
09.10.18 (20)
Optimizing the utilization of metrology tools
KLA-Tencor Corporation
US10101676B2
16.10.18 (27)
Spectroscopic beam profile overlay metrology
KLA-Tencor Corporation
EP3163251B1
14.11.18 (56)
METHOD AND SYSTEM FOR REGIONAL PHASE UNWRAPPING WITH PATTERN-ASSISTED CORRECTION | VERFAHREN UND SYSTEM ZUR REGIONALEN PHASENABWICKLUNG MIT STRUKTURUNTERSTÜTZTER KORREKTUR | PROCÉDÉ ET SYSTÈME DE DÉPLIEMENT DE PHASE RÉGIONALE AVEC CORRECTION ASSISTÉE PAR MOTIF
KLA-Tencor Corporation
US10151584B2
11.12.18 (84)
Periodic patterns and technique to control misalignment between two layers
KLA-Tencor Corporation
US10190868B2
29.01.19 (132)
Metrology system, method, and computer program product employing automatic transitioning between utilizing a library and utilizing regression for measurement processing
KLA-Tencor Corporation
US10197389B2
05.02.19 (139)
Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
KLA-Tencor Corporation
US10215693B2
26.02.19 (160)
Infrared spectroscopic reflectometer for measurement of high aspect ratio structures
KLA-Tencor Corporation
US10215560B2
26.02.19 (160)
Method for shape classification of an object
KLA-Tencor Corporation
US10215559B2
26.02.19 (160)
Metrology of multiple patterning processes
KLA-Tencor Corporation
US10234280B2
19.03.19 (183)
Reflection symmetric scatterometry overlay targets and methods
KLA-Tencor Corporation
US10234271B2
19.03.19 (183)
Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector
KLA-Tencor Corporation
US10288415B2
14.05.19 (240)
Critical dimension uniformity monitoring for extreme ultra-violet reticles
KLA-Tencor Corporation
Neuer Eintrag!
US10295342B2
21.05.19 (247)
System, method and computer program product for calibration of metrology tools
KLA-Tencor Corporation
Neuer Eintrag!
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