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Anmelder = KLA-Tencor Corporation


Erteilte Patente in der Einspruchsfrist

(DE B,C: 3 Monate nach Erteilung; EP B,C: 9 Monate nach Erteilung)

Patentschrift
Erteilung (Frist)
Anmelder
Titel der Erfindung (Arbeitstitel)
US9645079B2
09.05.17 (21)
Structured illumination for contrast enhancement in overlay metrology
KLA-Tencor Corporation
US9664734B2
30.05.17 (40)
Multi-oscillator, continuous Cody-Lorentz model of optical dispersion
KLA-Tencor Corporation
US9689804B2
27.06.17 (67)
Multi-channel backside wafer inspection
KLA-Tencor Corporation
US9709903B2
18.07.17 (89)
Overlay target geometry for measuring multiple pitches
KLA-Tencor Corporation
US9709386B1
18.07.17 (89)
Apparatus and methods for measuring properties in a TSV structure using beam profile reflectometry
KLA-Tencor Corporation
US9721055B2
01.08.17 (102)
Measurement model optimization based on parameter variations across a wafer
KLA-Tencor Corporation
US9719920B2
01.08.17 (102)
Scatterometry system and method for generating non-overlapping and non-truncated diffraction images
KLA-Tencor Corporation
US9726984B2
08.08.17 (109)
Aperture alignment in scatterometry metrology systems
KLA-Tencor Corporation
US9739719B2
22.08.17 (123)
Measurement systems having linked field and pupil signal detection
KLA-Tencor Corporation
US9739702B2
22.08.17 (123)
Symmetric target design in scatterometry overlay metrology
KLA-Tencor Corporation
US9784987B2
10.10.17 (172)
Apodization for pupil imaging scatterometry
KLA-Tencor Corporation
US9816810B2
14.11.17 (207)
Measurement of multiple patterning parameters
KLA-Tencor Corporation
US9835447B2
05.12.17 (229)
Periodic patterns and technique to control misalignment between two layers
KLA-Tencor Corporation
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