patentverein.de - Patente
Patentethik
Überwachung
Beispielhaft
Trivial
Kurios
Unverständlich

Anmelder = KLA-Tencor Corporation


Erteilte Patente in der Einspruchsfrist

(DE B,C: 3 Monate nach Erteilung; EP B,C: 9 Monate nach Erteilung)

Patentschrift
Erteilung (Frist)
Anmelder
Titel der Erfindung (Arbeitstitel)
US9863761B2
09.01.18 (15)
Critical dimension uniformity monitoring for extreme ultraviolet reticles
KLA-Tencor Corporation
US9863756B1
09.01.18 (15)
Line scan spectroscopic white light interferometry for semiconductor inspection and metrology
KLA-Tencor Corporation
US9864173B2
09.01.18 (15)
Systems and methods for run-time alignment of a spot scanning wafer inspection system
KLA-Tencor Corporation
US9869543B2
16.01.18 (22)
Reducing algorithmic inaccuracy in scatterometry overlay metrology
KLA-Tencor Corporation
US9874527B2
23.01.18 (29)
Removing process-variation-related inaccuracies from scatterometry measurements
KLA-Tencor Corporation
US9879977B2
30.01.18 (36)
Apparatus and method for optical metrology with optimized system parameters
KLA-Tencor Corporation
US9885656B2
06.02.18 (43)
Line scan knife edge height sensor for semiconductor inspection and metrology
KLA-Tencor Corporation
US9903711B2
27.02.18 (64)
Feed forward of metrology data in a metrology system
KLA-Tencor Corporation
US9958257B2
01.05.18 (130)
Increasing dynamic range of a height sensor for inspection and metrology
KLA-Tencor Corporation
US10030965B2
24.07.18 (212)
Model-based hot spot monitoring
KLA-Tencor Corporation
Neuer Eintrag!
Datenschutzerklärung